发明授权
- 专利标题: Process strength indicator
- 专利标题(中): 工艺强度指示器
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申请号: US09543404申请日: 2000-04-05
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公开(公告)号: US06304121B1公开(公告)日: 2001-10-16
- 发明人: Paul Peng-Sheng Wang
- 申请人: Paul Peng-Sheng Wang
- 主分类号: H03K512
- IPC分类号: H03K512
摘要:
A method and apparatus for dynamically evaluating the behavior of semiconductor devices in an integrated circuit and for providing an adjusted output is disclosed. In one configuration the method and apparatus disclosed herein is configured as a compensation system and comprises a detection subsystem and a switching subsystem. The detection subsystem is configured to receive a signal generated by one or more semiconductor devices and detect the magnitude of the received signal. Depending on desired system parameters, the magnitude of the received signal causes one or more semiconductor devices to conduct an output signal to a switching subsystem. In one configuration, a plurality of signals travel from the detection subsystem to the switching subsystem. The switching subsystem is configured to receive the signal(s) from the detection subsystem and generate a voltage or current having magnitude related to the input received from the detection subsystem. In one configuration the switching subsystem comprises a plurality of devices configured to conduct current when presented with a signal from the detection subsystem. In a dynamic manner, the present invention can adapt output to compensate for changes in device behavior resulting from temperature change and variation in process parameters during manufacture. In various other embodiments, interface may be made with a processor or other control apparatus to further supplement device behavior.
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