发明授权
US06304320B1 Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same 失效
平台装置及其制造方法,位置控制方法,曝光装置及其制造方法,以及其制造方法

  • 专利标题: Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
  • 专利标题(中): 平台装置及其制造方法,位置控制方法,曝光装置及其制造方法,以及其制造方法
  • 申请号: US09512766
    申请日: 2000-02-25
  • 公开(公告)号: US06304320B1
    公开(公告)日: 2001-10-16
  • 发明人: Keiichi TanakaAndrew HazeltonMike Binnard
  • 申请人: Keiichi TanakaAndrew HazeltonMike Binnard
  • 主分类号: G03B2760
  • IPC分类号: G03B2760
Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
摘要:
In a stage device, prior to two-dimensional movement of a stage, a first driving device disposed on a side of the stage where an object is loaded drives the stage in a first-axis direction, and a second driving device disposed on a side of the stage opposite to the side where the object is loaded drives the stage in a second-axis direction that is different from the first-axis direction. Thus, the stage is moved in two-dimensional directions. Therefore, in order to perform two-dimensional movement of the stage, a structure is possible in which each driving device is defined as a one-dimensional driving device, and in which one driving device is not driven by another driving device. Therefore, it is possible to move the object at high speed and to accurately control the position of the object with a simple structure. By using the stage device in order to move the wafer or the like, an exposure device of high throughput and high accuracy can be realized.
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