发明授权
- 专利标题: Cleaning apparatus
- 专利标题(中): 清洁装置
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申请号: US09361244申请日: 1999-07-27
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公开(公告)号: US06308361B1公开(公告)日: 2001-10-30
- 发明人: Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
- 申请人: Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
- 优先权: JP10-227570 19980728
- 主分类号: B08B104
- IPC分类号: B08B104
摘要:
A cleaning apparatus is suitable for cleaning workpieces that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The cleaning apparatus has a holding device for holding the substrate and a cleaning unit capable of slidably contacting the surface of the substrate. The cleaning unit has a nozzle for ejecting high-pressure cleaning liquid onto the substrate, and a cleaning member surrounding the nozzle.