发明授权
- 专利标题: Plasma CVD apparatus
- 专利标题(中): 等离子体CVD装置
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申请号: US09453226申请日: 1999-12-03
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公开(公告)号: US06312524B1公开(公告)日: 2001-11-06
- 发明人: Yoichi Ogawa , Tetsuo Mizumura , Akira Yano , Hideo Kusada , Takashi Kubota , Michio Asano , Kunio Wakai
- 申请人: Yoichi Ogawa , Tetsuo Mizumura , Akira Yano , Hideo Kusada , Takashi Kubota , Michio Asano , Kunio Wakai
- 优先权: JP8-239517 19960910
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A continuous plasma CVD apparatus, characterized in that frequency of high-frequency bias is in the range of 50-900 KHz, a blocking condenser is provided between a thin film and a high-frequency source so that the product C·f of electrostatic capacity C of the blocking condenser and frequency f of the high-frequency source is 0.02 [F·Hz] or more, and the total of impedances of all the rollers provided in the route of from a substrate unwind roller to a rotating drum is 10 k&OHgr; or more and the total of impedances of all the rollers provided in the route of from the rotating drum to a wind roller is 10 k&OHgr; or more. According to this apparatus, it becomes possible to continuously form a film without causing damage and deterioration of the substrate.