A silver halide photographic material has been provided, having in a layer arrangement at one or both sides of a subbed support, corresponding with a single-side coated or a double-side coated material respectively, one or more layer(s) comprising a light-sensitive silver halide emulsion, one or more protective antistress layer(s) and, optionally, an outermost afterlayer, wherein at least one of said layers, subbing layer(s) inclusive, further comprises means in order to provide, when conditioned at a relative humidity of at most 30%, an electrical resistance, measured as described in Research Disclosure June 1992, item 33840, of from 4×109 &OHgr;/sq. up to 5×1010 &OHgr;/sq. for the layer having the lowest resistance.