Invention Grant
- Patent Title: Polyamide composition including metal salt
- Patent Title (中): 聚酰胺组合物包括金属盐
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Application No.: US09429639Application Date: 1999-10-29
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Publication No.: US06316587B1Publication Date: 2001-11-13
- Inventor: Yuung-Ching Sheen , Jen-Lien Lin , Jiang-Jen Lin , Meng-Yao Yang
- Applicant: Yuung-Ching Sheen , Jen-Lien Lin , Jiang-Jen Lin , Meng-Yao Yang
- Main IPC: C08G6926
- IPC: C08G6926
Abstract:
The present invention provides a polyamide composition comprising: a polyamide containing an alkylene oxide group; and a metal salt. The polyamide composition of the present invention has long lasting antistatic properties and a lower surface resistivity than the polyamide alone.
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