发明授权
- 专利标题： Exposure apparatus, method of controlling same, and device manufacturing method
- 专利标题（中）： 曝光装置，控制方法以及装置制造方法
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申请号： US09356698申请日： 1999-07-20
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公开(公告)号： US06320646B1公开(公告)日： 2001-11-20
- 发明人: Takashi Mouri
- 申请人： Takashi Mouri
- 优先权： JP10-227558 19980729
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
An exposure apparatus exposes a substrate to a pattern on a reticle in accordance with a job transferred to the apparatus proper and by executing predetermined calibration processing. The apparatus has a function which, when a job and a reticle used in exposure of a substrate in a current lot are the same as a job and a reticle that were used in exposure of a substrate in a preceding lot, bypasses re-transfer of a job to the apparatus proper and/or the calibration processing in regard to exposure of the current lot.
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