发明授权
US06320648B1 Method and apparatus for improving pattern fidelity in diffraction-limited imaging
有权
用于改善衍射极限成像中图案保真度的方法和装置
- 专利标题: Method and apparatus for improving pattern fidelity in diffraction-limited imaging
- 专利标题(中): 用于改善衍射极限成像中图案保真度的方法和装置
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申请号: US09414861申请日: 1999-10-12
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公开(公告)号: US06320648B1公开(公告)日: 2001-11-20
- 发明人: Steven R. J. Brueck , Xiaolan Chen
- 申请人: Steven R. J. Brueck , Xiaolan Chen
- 主分类号: G03B2742
- IPC分类号: G03B2742
摘要:
The present invention involves the use of pupil plane filters to enhance optical imaging for both lithography and microscopy. The present invention includes numerous pupil plane filter strategies for enhancing optical lithography. A square pupil plane filter suitably restricts the imaging to a nearly diffraction limited regime. Moreover, pupil plane filters are suitably used in off-axis illumination (OAI) and imaging interferometric lithography (ILL). The techniques of OAI and ILL along with the use of pupil-plane filters are applicable in, for example, any diffraction-limited situation where the limit is imposed by the characteristics of the optical system rather than the transmission medium and where the illumination system is under the control of the experimenter.