发明授权
- 专利标题： Overlay measuring pattern, and photomask
- 专利标题（中）： 覆盖测量图案和光掩模
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申请号： US09265858申请日： 1999-03-11
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公开(公告)号： US06326106B1公开(公告)日： 2001-12-04
- 发明人: Tetsuya Kitagawa
- 申请人： Tetsuya Kitagawa
- 优先权： JP10-082826 19980313
- 主分类号： G03F900
- IPC分类号： G03F900
摘要：
An overlay measuring pattern has a rectangular portion and band-shaped portions separated from opposite sides of the rectangular portion by an equal distance and parallel to the sides. Even when a photoresist shrinks upon heating after the overlay measuring pattern is transferred to the photoresist, the taper amounts of the sides of the rectangular portion transferred to the photoresist equal each other in their sections between opposite sides. Hence, the overlay shift can be accurately obtained.