发明授权
- 专利标题： Dip coating apparatus
- 专利标题（中）： 浸涂装置
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申请号： US09276728申请日： 1999-03-26
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公开(公告)号： US06328800B1公开(公告)日： 2001-12-11
- 发明人: Junichi Yamazaki
- 申请人： Junichi Yamazaki
- 优先权： JP10-100270 19980327
- 主分类号： B05C300
- IPC分类号： B05C300
摘要：
A dip coating apparatus including a substrate supporter which supports a substrate to be coated and which has a gas discharger which has a plurality of holes formed therein from which a gas is discharged; a gas supplying passage through which the gas is supplied to the gas discharger; and a gas supplying valve which is disposed at a position in the gas supplying passage and in which the gas is fed to the gas discharger when the gas supplying valve is opened, wherein a pressure loss in the gas discharger is greater than two times a pressure loss in the gas supplying passage between the gas supplying valve and the gas discharger.