发明授权
US06328857B1 Method for forming coating on substrate and sputtering apparatus used for the method 失效
在基板上形成涂层的方法和用于该方法的溅射装置

  • 专利标题: Method for forming coating on substrate and sputtering apparatus used for the method
  • 专利标题(中): 在基板上形成涂层的方法和用于该方法的溅射装置
  • 申请号: US09632617
    申请日: 2000-08-04
  • 公开(公告)号: US06328857B1
    公开(公告)日: 2001-12-11
  • 发明人: Toshiaki AnzakiEtsuo Ogino
  • 申请人: Toshiaki AnzakiEtsuo Ogino
  • 优先权: JP11-222577 19990805
  • 主分类号: C23C1434
  • IPC分类号: C23C1434
Method for forming coating on substrate and sputtering apparatus used for the method
摘要:
Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.
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