发明授权
US06328857B1 Method for forming coating on substrate and sputtering apparatus used for the method
失效
在基板上形成涂层的方法和用于该方法的溅射装置
- 专利标题: Method for forming coating on substrate and sputtering apparatus used for the method
- 专利标题(中): 在基板上形成涂层的方法和用于该方法的溅射装置
-
申请号: US09632617申请日: 2000-08-04
-
公开(公告)号: US06328857B1公开(公告)日: 2001-12-11
- 发明人: Toshiaki Anzaki , Etsuo Ogino
- 申请人: Toshiaki Anzaki , Etsuo Ogino
- 优先权: JP11-222577 19990805
- 主分类号: C23C1434
- IPC分类号: C23C1434
摘要:
Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.
信息查询