发明授权
- 专利标题: Heat-developable photosensitive material and method for forming image using the same
- 专利标题(中): 热显影感光材料及使用其形成图像的方法
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申请号: US09537764申请日: 2000-03-30
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公开(公告)号: US06329127B1公开(公告)日: 2001-12-11
- 发明人: Tadashi Ito , Katsuyuki Watanabe , Kazunobu Katoh , Minoru Sakai
- 申请人: Tadashi Ito , Katsuyuki Watanabe , Kazunobu Katoh , Minoru Sakai
- 优先权: JP11-089674 19990330; JP11-089882 19990330; JP11-090125 19990330; JP11-281747 19991001
- 主分类号: G03C1498
- IPC分类号: G03C1498
摘要:
An object of the present invention is to provide a heat-developable photosensitive material of less heat development temperature and humidity dependency, which is unlikely to be affected by uneven temperature distribution in heat development apparatuses and humidity condition, and can stably form uniform images, in particular, a heat-developable photosensitive material of improved stability of coating solutions overtime, which can form uniform ultrahigh contrast images without unevenness, which are suitable for mechanical processes, and exhibit suppressed fluctuation of photographic performance depending on the storage condition. According to the present invention, there is provided a heat-developable photosensitive material having at least one photosensitive image-forming layer comprising an organic silver salt, a photosensitive silver halide, a reducing agent and an organic binder, wherein at least one of the photosensitive image-forming layer and a layer adjacent to the photosensitive image-forming layer contains a first halogen-releasing precursor having at least one dissociative or hydrophilic substituent and a second hydrophobic halogen-releasing precursor.
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