发明授权
- 专利标题: Semiconductor wafer and semiconductor device
- 专利标题(中): 半导体晶圆和半导体器件
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申请号: US09253041申请日: 1999-02-19
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公开(公告)号: US06329700B1公开(公告)日: 2001-12-11
- 发明人: Youichi Ishimura , Hideki Takahashi , Norihisa Asano
- 申请人: Youichi Ishimura , Hideki Takahashi , Norihisa Asano
- 优先权: JP10-290484 19981013
- 主分类号: H01L23544
- IPC分类号: H01L23544
摘要:
A semiconductor wafer and a semiconductor device with more chips are obtained. The semiconductor wafer includes a plurality of dicing lines (DXa, DXb, DYa, DYb) extending in the lateral direction (X) and in the longitudinal direction (Y) with an interval (L1) therebetween, and a semiconductor element forming region (CR1) with a semiconductor element, sectioned by the dicing lines (DXa, DXb, DYa, DYb). The dicing lines both in the lateral direction (X) and in the longitudinal direction (Y) have alternate widths (La, Lb), one of which (Lb) is larger than the other (La).
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