发明授权
- 专利标题: Developing processing method and apparatus
- 专利标题(中): 开发加工方法和装置
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申请号: US09473125申请日: 1999-12-28
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公开(公告)号: US06333144B1公开(公告)日: 2001-12-25
- 发明人: Hideaki Nomura , Kazuo Sanada
- 申请人: Hideaki Nomura , Kazuo Sanada
- 优先权: JP10-373556 19981228
- 主分类号: G03D1304
- IPC分类号: G03D1304
摘要:
In a developing processing method and apparatus in which developing processing is carried out in such a manner that a processing solution is jetted from jetting holes to an emulsion surface of a photosensitive material, a hole diameter of the jetting holes is set to be 0.5 mm to 0.9 mm. In this case, clogging of the jetting holes does not easily occur and the processing solution can be jetted from the jetting holes stably for a long period of time. Accordingly, non-uniform processing is rarely caused. Intervals between the jetting holes in the transverse direction of the photosensitive material are each in a range of 3.0 mm to 4.5 mm. The jetting holes are disposed in such a manner that jetting holes of adjacent three rows in a direction in which the photosensitive material is conveyed are located at different positions to form a staggered arrangement, and the three rows of jetting holes are formed repeatedly. By substantially shortening the intervals between the jetting holes in the transverse direction of the photosensitive material, non-uniform processing does not occur even in a photosensitive material having a large transverse direction, and a desired photographic property can be obtained.
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