发明授权
- 专利标题: Method of dividing a wafer
- 专利标题(中): 分割晶片的方法
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申请号: US09620709申请日: 2000-07-20
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公开(公告)号: US06337258B1公开(公告)日: 2002-01-08
- 发明人: Hideo Nakayoshi , Shinya Takyu , Keisuke Tokubuchi , Tetsuya Kurosawa
- 申请人: Hideo Nakayoshi , Shinya Takyu , Keisuke Tokubuchi , Tetsuya Kurosawa
- 优先权: JP11-207793 19990722
- 主分类号: H01L2146
- IPC分类号: H01L2146
摘要:
Grooves are formed in an element formation surface of a wafer along dicing lines or chip dividing lines. The grooves are deeper than a thickness of a finished chip. A holding member is attached on the element formation surface of the wafer. A bottom surface of the wafer is lapped and polished to the thickness of the finished chip, thereby dividing the wafer into chips. The chips are transferred while being held by porous adsorption.
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