发明授权
- 专利标题： Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
- 专利标题（中）： 含有溶解抑制剂和释放酸的化合物的光敏组合物
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申请号： US08247356申请日： 1994-05-23
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公开(公告)号： US06340552B1公开(公告)日： 2002-01-22
- 发明人: Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
- 申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
- 优先权： JP2-418772 19901227; JP3-151942 19910624
- 主分类号： G03C1492
- IPC分类号： G03C1492
摘要：
A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents