发明授权
- 专利标题: Radiation-sensitive planographic printing plate
- 专利标题(中): 辐射敏感平版印刷版
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申请号: US09596051申请日: 2000-06-16
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公开(公告)号: US06340554B1公开(公告)日: 2002-01-22
- 发明人: Koichi Kawamura , Kazuo Maemoto , Sumiaki Yamasaki , Tadahiro Sorori , Hiroshi Tashiro , Kiyotaka Fukino
- 申请人: Koichi Kawamura , Kazuo Maemoto , Sumiaki Yamasaki , Tadahiro Sorori , Hiroshi Tashiro , Kiyotaka Fukino
- 优先权: JP9-248994 19970912; JP10-22406 19980203; JP10-43921 19980225; JP10-77460 19980325; JP10-87818 19980331; JP10-115354 19980424
- 主分类号: G03F7004
- IPC分类号: G03F7004
摘要:
An object of the present invention is to provide excellent in terms of durability wherein development with water, or direct production of the plate from digital data through infrared laser recording in particular such that a special process is not necessary, is possible, by forming on a support a photosensitive layer containing a reaction product of a compound having in a molecule thereof a functional group X and a functional group Y and a compound represented by a formula (1) stated below, or alternatively, containing a polymerization product of a compound having the functional group X and a compound represented by the formula (1) stated below. Further by incorporating water-insoluble particles in this photosensitive layer, many voids are formed in the photosensitive layer, further improving sensitivity and discrimination. The functional group X is a group selected from among a sulfonic acid ester group, a disulfone group, a sulfonimide group, and an alkoxyalkyl ester group and the functional group Y is a group selected from among —OH, —NH2, —COOH, —NH—CO—R3, and —Si(OR4)3 [wherein R3 and R4 each represents an alkyl group or an aryl group]. (R1)n—X—(OR2)4−n (1) (1) is (R1)n—X—(OR2)4−n wherein R1 and R2 each represents an alkyl group or an aryl group; X represents Si, Al, Ti, or Zr; and n represents an integer from 0 to 2.