发明授权
- 专利标题: Semiconductor device and method for forming the same
- 专利标题(中): 半导体装置及其形成方法
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申请号: US09237854申请日: 1999-01-27
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公开(公告)号: US06340830B1公开(公告)日: 2002-01-22
- 发明人: Yasuhiko Takemura
- 申请人: Yasuhiko Takemura
- 优先权: JP4-174883 19920609
- 主分类号: H01L2701
- IPC分类号: H01L2701
摘要:
In a field effect type device having a thin film-like active layer, there is provided a thin film-like semiconductor device including a top side gate electrode on the active layer and a bottom side gate electrode connected to a static potential, the bottom side gate electrode being provided between the active layer and a substrate. The bottom side gate electrode may be electrically connected to only one of a source and a drain of the field effect type device. Also, the production methods therefor are disclosed.
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