发明授权
US06351305B1 Exposure apparatus and exposure method for transferring pattern onto a substrate
失效
用于将图案转印到基板上的曝光装置和曝光方法
- 专利标题: Exposure apparatus and exposure method for transferring pattern onto a substrate
- 专利标题(中): 用于将图案转印到基板上的曝光装置和曝光方法
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申请号: US09173530申请日: 1998-10-15
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公开(公告)号: US06351305B1公开(公告)日: 2002-02-26
- 发明人: Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
- 申请人: Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
- 优先权: JP5-161588 19930630; JP5-345619 19931222; JP6-116800 19940530; JP6-123762 19940606; JP6-141326 19940623; JP6-177898 19940729; JP6-200494 19940825
- 主分类号: G03B2732
- IPC分类号: G03B2732
摘要:
An exposure method includes first through third steps. In the first step, respective first and second illumination regions of a mask having a predetermined pattern are illuminated with an illumination light having a predetermined wavelength. In the second step, an image of the mask is formed, respectively, in first and second exposure regions (formed on a substrate) based on the illumination that passes through the first and second illumination regions. The first and second exposure regions each have a substantially polygonal shape defined by two parallel sides and two sides other than the two parallel sides. In the third step, the first and second exposure regions and the substrate are moved relatively in a first direction such that the first and second exposure regions are formed in different positions in a second direction which crosses the first direction.