发明授权
US06352084B1 Substrate treatment device 失效
底物处理装置

  • 专利标题: Substrate treatment device
  • 专利标题(中): 底物处理装置
  • 申请号: US09297219
    申请日: 1999-04-23
  • 公开(公告)号: US06352084B1
    公开(公告)日: 2002-03-05
  • 发明人: John Oshinowo
  • 申请人: John Oshinowo
  • 优先权: DE19644253 19961024
  • 主分类号: B08B304
  • IPC分类号: B08B304
Substrate treatment device
摘要:
A device for the treatment of substrates (2) has a container having a bottom and being filled with a treatment fluid. The treatment fluid streams in from below through the bottom of the container. At least two inlet tubes are provided for the treatment fluid underneath the container bottom. Each of the at least two inlet tubes is provided with projecting comb-like distribution channels. The at least two inlet tubes and the distribution channels are arranged in a common plane. The distribution channels of one of the at least two inlet tubes are respectively positioned between two of the distribution channels of the other one of the two inlet tubes.
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