发明授权
- 专利标题: Method of fabricating SRAM cell having a field region
- 专利标题(中): 制造具有场区域的SRAM单元的方法
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申请号: US09478490申请日: 2000-01-06
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公开(公告)号: US06352888B1公开(公告)日: 2002-03-05
- 发明人: Dong Sun Kim
- 申请人: Dong Sun Kim
- 优先权: KR96-75049 19961228
- 主分类号: H01L218234
- IPC分类号: H01L218234
摘要:
A static random access memory (SRAM) cell includes first and second load devices, first and second access transistors, first and second drive transistors, and two bit lines. The SRAM includes a substrate; an active region in the substrate, the active region being formed in a direction; gate electrodes of the first and second access transistors crossing the active region, the gate electrodes of the first and second access transistors are parallel with each other; gate electrodes of the first and second drive transistors crossing the active region, the gate electrodes of the first and second drive transistors are parallel with each other; and first and second load devices on the gate electrodes of the first and second access transistors, the first and second load devices are parallel with each other.
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