发明授权
US06352888B1 Method of fabricating SRAM cell having a field region 有权
制造具有场区域的SRAM单元的方法

  • 专利标题: Method of fabricating SRAM cell having a field region
  • 专利标题(中): 制造具有场区域的SRAM单元的方法
  • 申请号: US09478490
    申请日: 2000-01-06
  • 公开(公告)号: US06352888B1
    公开(公告)日: 2002-03-05
  • 发明人: Dong Sun Kim
  • 申请人: Dong Sun Kim
  • 优先权: KR96-75049 19961228
  • 主分类号: H01L218234
  • IPC分类号: H01L218234
Method of fabricating SRAM cell having a field region
摘要:
A static random access memory (SRAM) cell includes first and second load devices, first and second access transistors, first and second drive transistors, and two bit lines. The SRAM includes a substrate; an active region in the substrate, the active region being formed in a direction; gate electrodes of the first and second access transistors crossing the active region, the gate electrodes of the first and second access transistors are parallel with each other; gate electrodes of the first and second drive transistors crossing the active region, the gate electrodes of the first and second drive transistors are parallel with each other; and first and second load devices on the gate electrodes of the first and second access transistors, the first and second load devices are parallel with each other.
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