发明授权
US06365016B1 Method and apparatus for arc plasma deposition with evaporation of reagents
有权
用试剂蒸发电弧等离子体沉积的方法和装置
- 专利标题: Method and apparatus for arc plasma deposition with evaporation of reagents
- 专利标题(中): 用试剂蒸发电弧等离子体沉积的方法和装置
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申请号: US09271655申请日: 1999-03-17
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公开(公告)号: US06365016B1公开(公告)日: 2002-04-02
- 发明人: Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
- 申请人: Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
- 主分类号: C23C1408
- IPC分类号: C23C1408
摘要:
A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.
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