发明授权
- 专利标题: Trap device and trap system
- 专利标题(中): 陷阱设备和陷阱系统
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申请号: US09485616申请日: 2000-02-14
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公开(公告)号: US06368371B1公开(公告)日: 2002-04-09
- 发明人: Norihiko Nomura , Nobuharu Noji
- 申请人: Norihiko Nomura , Nobuharu Noji
- 优先权: JP10-025041 19980122; JP10-050194 19980216
- 主分类号: B01D4508
- IPC分类号: B01D4508
摘要:
The present invention provides a trap apparatus which is capable of increasing the trapping efficiency while fulfilling a conductance allowed by a vacuum chamber in a depositing process or the like, for thereby increasing the service life of a vacuum pump and protecting a toxic substance removing device for increased operation reliability, and reducing equipment and running costs. The trap apparatus has a trap unit (18) disposed in a discharge passage (14) for discharging therethrough a gas from a vacuum chamber (10) with a vacuum pump (12) for trapping and removing a product in a discharged gas. The trap unit (18) has trap passages comprising an upstream passage portion (44) spreading outwardly from the center and a downstream passage portion (42) directed inwardly toward the center.
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