An oxide superconducting element is formed on a substrate 10 by a layered structure 30 formed of oxide superconducting thin-film and a non-superconducting thin-film layers. The element is a superconducting regular current interval voltage step element. The current-voltage characteristic curve in a magnetic field has a voltage step being generated at regular bias current intervals. The layered structure 30 is formed by depositing alternately M′Ba2Cu3O7 (M′ is one or a combination of more than two elements of Nd, Sm and Eu) and M″Ba2Cu3O7 thin-films (M″ is either Pr or Sc, or a combination of the two elements).