To provide a burn-in method and device capable of accelerating burn-in also in a peripheral circuit portion and a logic circuit portion as well as a memory cell array portion. A high temperature stress is applied to a wafer to be an evaluation object (Step SP11). Next, a low temperature stress and an electric stress are applied to the wafer (Step SP12). Then, it is decided whether a predetermined stress is applied to the wafer or not (Step SP13). If a result of the decision at the Step SP13 is “YES”, it is decided whether a defective portion is generated in each chip of the wafer or not (Step SP14). Referring to a chip decided to have a failure generated thereon as a result of the decision at the Step SP14, it is decided whether repair is executed for the defective portion or not (Step SP15). If a result of the decision at the Step SP15 is “YES”, the repair is executed for the defective portion (Step SP16).