发明授权
US06372627B1 Method and arrangement for characterization of focused-ion-beam insulator deposition 失效
聚焦离子束绝缘体沉积表征的方法和装置

Method and arrangement for characterization of focused-ion-beam insulator deposition
摘要:
According to one aspect of the disclosure and a particular example application directed to a flip-chip packaged die, a method for acquiring a signal from a target node in the circuit side includes removing substrate via the back side of the die to form an access area over the target node. A material is deposited in the access area over the target node in such a way to form simultaneously a conductive core and an immediately adjacent insulator. The conductive core is then used to couple a test signal between the target node and the conductive core. Other aspects of the disclosure include using a focused ion-beam system to provide varying concentrations of Gallium in forming simultaneously the conductive core and the immediately adjacent insulator. These aspects significantly lessen integrated circuit analysis and testing procedures.
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