Invention Grant
- Patent Title: Silica glass and its manufacturing method
- Patent Title (中): 二氧化硅玻璃及其制造方法
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Application No.: US09933749Application Date: 2001-08-22
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Publication No.: US06374639B2Publication Date: 2002-04-23
- Inventor: Norio Komine , Seishi Fujiwara , Hiroki Jinbo
- Applicant: Norio Komine , Seishi Fujiwara , Hiroki Jinbo
- Priority: JP8-218991 19960821; JP8-221248 19960822; JP8-221254 19960822; JP9-246841 19970911
- Main IPC: C03B1914
- IPC: C03B1914

Abstract:
A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
Public/Granted literature
- US20020013208A1 Silica glass and its manufacturing method Public/Granted day:2002-01-31
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