发明授权
- 专利标题： Optical member for photolithography and photolithography apparatus
- 专利标题（中）： 用于光刻和光刻设备的光学构件
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申请号： US09494039申请日： 2000-01-31
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公开(公告)号： US06377332B1公开(公告)日： 2002-04-23
- 发明人: Shigeru Sakuma , Masaki Shiozawa
- 申请人： Shigeru Sakuma , Masaki Shiozawa
- 优先权： JP11-026746 19990203; JP11-037481 19990216
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
An optical member for photolithography made of a calcium fluoride crystal exhibits an internal transmittance of 99.5%/cm or greater with respect to light having a specific wavelength of 185 nm or shorter.
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