Invention Grant
- Patent Title: Method for manufacturing electron emission element, electron source, and image forming apparatus
-
Application No.: US09848360Application Date: 2001-05-04
-
Publication No.: US06379211B2Publication Date: 2002-04-30
- Inventor: Toshikazu Onishi , Yoshikazu Banno , Michiyo Nishimura , Toshihiko Takeda , Keisuke Yamamoto , Tomoko Maruyama
- Applicant: Toshikazu Onishi , Yoshikazu Banno , Michiyo Nishimura , Toshihiko Takeda , Keisuke Yamamoto , Tomoko Maruyama
- Priority: JP10-029538 19980212
- Main IPC: H01J902
- IPC: H01J902

Abstract:
A method for manufacturing an electron emission element comprising, between its electrodes, a conductive film having an electron emission section. The method comprising the steps of forming a gap in the conductive film located between the electrodes, and applying a voltage between the electrodes in an atmosphere that has an aromatic compound with a polarity or a polar group and in which the partial pressure ratio of water to the aromatic compound is 100 or less.
Public/Granted literature
- US20020013113A1 Method for manufacturing electron emission element, electron source, and image forming apparatus Public/Granted day:2002-01-31
Information query