发明授权
- 专利标题: Solid-state imaging device with a film of low hydrogen permeability and a method of manufacturing same
- 专利标题(中): 具有低透氢性的薄膜的固态成像装置及其制造方法
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申请号: US09666505申请日: 2000-09-20
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公开(公告)号: US06379993B1公开(公告)日: 2002-04-30
- 发明人: Takashi Nakano , Kohichi Arai , Nobukazu Teranishi , Nobuhiko Mutoh
- 申请人: Takashi Nakano , Kohichi Arai , Nobukazu Teranishi , Nobuhiko Mutoh
- 优先权: JP9-088320 19970407
- 主分类号: H01L21339
- IPC分类号: H01L21339
摘要:
A semiconductor substrate has a sensor disposed in a surface layer on an entrance surface thereof for receiving incident light, and an intermediate-refractive-index film is disposed on the entire entrance surface of the semiconductor substrate either directly or with an insulating film interposed therebetween. The intermediate-refractive-index film has a refractive index lower than the semiconductor substrate and a low hydrogen permeability thin film is disposed on an entrance surface of the intermediate-refractive-index film and having refractive index lower than the intermediate-refractive-index film the thin film being permeable to hydrogen. The intermediate-refractive-index film serves as a reflection-resistant film. Reflections of incident light applied through the thin film and the reflection-resistant film of the sensor of the semiconductor substrate are suppressed. The intermediate-refractive-index film has a hole defined therein for passage of hydrogen therethrough upon hydrogen alloying. After the thin film is formed on the surface of the intermediate-refractive-index film, hydrogen passes through the hole in the intermediate-refractive-index film to reach the surface of the semiconductor substrate near the sensor upon hydrogen alloying.
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