Disclosed is an improved spinning washer comprising: a spinning table for fixedly holding a wafer to be washed; water flushing device; first brush which can be put in coplanar position relative to the lower surface of the wafer round the circumference of the spinning table; and second brush confronting the first brush. The second brush can be put in contact with the upper surface of the wafer in its operative position. The opposite surfaces and circumference side of the wafer can be washed without the fear of breaking the wafer no matter how it may be thin.