发明授权
- 专利标题： Polyether resin and coating solution for forming insulation film
- 专利标题（中）： 用于形成绝缘膜的聚醚树脂和涂层溶液
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申请号： US09657062申请日： 2000-09-07
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公开(公告)号： US06388044B1公开(公告)日： 2002-05-14
- 发明人: Yuji Yoshida , Akira Yokota , Sadanobu Iwase , Hyuncheol Choi
- 申请人： Yuji Yoshida , Akira Yokota , Sadanobu Iwase , Hyuncheol Choi
- 优先权： JP11-255536 19990909; JP11-332765 19991124
- 主分类号： C08G6540
- IPC分类号： C08G6540
摘要：
The present invention provides a thermosetting polyether resin obtained by polycondensing a dihalogen compound with a bisphenol compound to obtain a polyether resin having a repeating unit represented by the formula (1), and introducing a functional group which causes a cross-linking reaction by heating into the resulted polyether resin; The present invention also provides a polyether resin having a low dielectric constant represented by the formula (3):
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