发明授权
US06389045B1 Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
有权
ArF和F2光刻准分子激光器的光脉冲拉伸和平滑
- 专利标题： Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
- 专利标题（中）： ArF和F2光刻准分子激光器的光脉冲拉伸和平滑
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申请号： US09550558申请日： 2000-04-17
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公开(公告)号： US06389045B1公开(公告)日： 2002-05-14
- 发明人: Klaus Mann , Thomas Schröder , Bernd Schäfer , Uwe Leinhos , Uwe Stamm
- 申请人： Klaus Mann , Thomas Schröder , Bernd Schäfer , Uwe Leinhos , Uwe Stamm
- 主分类号： H01S310
- IPC分类号： H01S310
摘要：
A method and apparatus are provided for temporally stretching and smoothing of the pulses of an output beam of excimer and lithography lasers. The method and apparatus are based upon providing an optical delay line or circuit having a plurality of optical reflectors and a plurality of beam recombiners or splitters so arranged as to divide the pulse into numerous portions which vary in their travel time through the circuit. As a result, the energy of the incident pulse is greatly stretched and smoothed.
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