发明授权
- 专利标题: Magnetoresistance effect type complex head and method for manufacturing the same
- 专利标题(中): 磁阻效应型复合头及其制造方法
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申请号: US09400543申请日: 1999-09-21
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公开(公告)号: US06392851B1公开(公告)日: 2002-05-21
- 发明人: Nobuyuki Ishiwata , Tsutomu Ishi
- 申请人: Nobuyuki Ishiwata , Tsutomu Ishi
- 优先权: JP10-268142 19980922
- 主分类号: G11B5187
- IPC分类号: G11B5187
摘要:
Disclosed is a magnetroresistance effect type complex head including: (1) a magnetroresistance effect head including: a magnetroresistance effect element 15 which includes a central region 12 for detecting a magnetic field from a record medium and a pair of terminal portions 13, 14 for supplying a bias magnetic field and a current to the central region; a pair of magnetic separators 11, 16 confronting each other, sandwiching the magnetroresistance effect element, and each including an insulator; and a first and second magnetic shield films 10, 17 confronting each other, and sandwitching the magnetroresistance effect element and the pair of magnetic separators; (2) an inductive head including: a first magnetic pole film 17 which is also used as the second magnetic shield; a magnetic gap 18 piled up on the first magnetic pole; a second magnetic pole film 19 piled up on the magnetic gap; and a coil pattern for generating a magnetic flux which flows through the first and second magnetic pole films; (3) a pair of pits 20 recessed in a direction perpendicular to an air bearing surface and disposed on both lateral sides of the second magnetic pole film to determine a width of the second magnetic pole film; and (4) a pattern 8 for determining a position of the pair of recesses.
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