Invention Grant
US06398609B2 Method of fabricating field emission arrays employing a hard mask to define column lines and another mask to define emitter tips and resistors
失效
使用硬掩模制造场致发射阵列来定义列线的方法和用于限定发射极尖端和电阻器的另一掩模的方法
- Patent Title: Method of fabricating field emission arrays employing a hard mask to define column lines and another mask to define emitter tips and resistors
- Patent Title (中): 使用硬掩模制造场致发射阵列来定义列线的方法和用于限定发射极尖端和电阻器的另一掩模的方法
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Application No.: US09847926Application Date: 2001-05-03
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Publication No.: US06398609B2Publication Date: 2002-06-04
- Inventor: Ammar Derraa
- Applicant: Ammar Derraa
- Main IPC: H01J902
- IPC: H01J902

Abstract:
A method of fabricating a field emission array that employs a single mask to define the emitter tips thereof and their corresponding resistors. A layer of conductive material is disposed over a substrate of the field emission array. A plurality of substantially mutually parallel conductive lines is defined from the layer of conductive material. At least one layer of semiconductive material or conductive material is disposed over the conductive lines and over the regions of the substrate exposed between adjacent conductive lines. A mask material is disposed over the layer of semiconductive material or conductive material, substantially above each of the conductive lines. Portions of the layer of semiconductive material or conductive material exposed through the mask material may be removed to expose substantially longitudinal center portions of the conductive lines. Other portions of the layer of semiconductive material or conductive material may remain over peripheral lateral edges of the conductive lines. The mask material may be removed and the layer of semiconductive material or conductive material planarized. A mask is disposed over the field emission array and portions of the layer of semiconductive material or conductive material removed therethrough to define emitter tips and their corresponding resistors. The substantially longitudinal center portion of each of the conductive lines may be removed to electrically isolate adjacent columns of pixels of the field emission array from each other. Field emission arrays fabricated by the method of the present invention are also within the scope of the present invention.
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