发明授权
- 专利标题： Ester compounds having alicyclic structure and method for preparing same
- 专利标题（中）： 具有脂环结构的酯化合物及其制备方法
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申请号： US09842006申请日： 2001-04-26
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公开(公告)号： US06403823B2公开(公告)日： 2002-06-11
- 发明人: Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Tsunehiro Nishi , Jun Hatakeyama
- 申请人： Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Tsunehiro Nishi , Jun Hatakeyama
- 优先权： JP2000-131164 20000428
- 主分类号： C07C6974
- IPC分类号： C07C6974
摘要：
Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is an unsubstituted or halo-substituted acyl or alkoxycarbonyl group of 1-15 carbon atoms, R3 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.
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