发明授权
- 专利标题: Lithographic projection method
- 专利标题(中): 平版投影法
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申请号: US09588783申请日: 2000-06-07
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公开(公告)号: US06406834B1公开(公告)日: 2002-06-18
- 发明人: Jan Jaap Kuit , Jan A. M. Smits , Judocus M. D. Stoeldraijer
- 申请人: Jan Jaap Kuit , Jan A. M. Smits , Judocus M. D. Stoeldraijer
- 优先权: EP99201820 19990609
- 主分类号: G03F720
- IPC分类号: G03F720
摘要:
A method of projecting an image onto a plurality of target areas on a substrate whereby use is made of a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system for imaging an irradiated portion of the mask onto a target area of the substrate, whereby the substrate is to be irradiated with images from at least two different masks, characterized by the following steps: (a) providing a batch of substrates, each at least partially coated with a layer of radiation-sensitive material; (b) providing storage means for temporary storage of the batch; (c) providing a first mask on the mask table; (d) irradiating a first set of target areas of a first substrate with an image from the first mask, and then placing that substrate in the storage means; (e) repeating step (d) for each of the other substrates in the batch; (f) replacing the first mask by a second mask; (g) providing a primary substrate from the storage means on the substrate table and irradiating a second set of target areas of that substrate with an image from the second mask; (h) repeating step (g) for each of the other substrates stored in the storage means.