Invention Grant
US06407409B2 Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis
有权
单晶氮化镓(GAN)本体合成方法和装置
- Patent Title: Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis
- Patent Title (中): 单晶氮化镓(GAN)本体合成方法和装置
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Application No.: US09836780Application Date: 2001-04-16
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Publication No.: US06407409B2Publication Date: 2002-06-18
- Inventor: Hak Dong Cho , Sang Kyu Kang
- Applicant: Hak Dong Cho , Sang Kyu Kang
- Main IPC: H01L2922
- IPC: H01L2922

Abstract:
A method and apparatus for homoepitaxial growth of freestanding, single bulk crystal Gallium Nitride (GaN) are provided, wherein a step of nucleating GaN in a reactor results in a GaN nucleation layer having a thickness of a few monolayers. The nucleation layer is stabilized, and a single bulk crystal GaN is grown from gas phase reactants on the GaN nucleation layer. The reactor is formed from ultra low oxygen stainless steel.
Public/Granted literature
- US20010022154A1 Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis Public/Granted day:2001-09-20
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