Invention Grant
US06407409B2 Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis 有权
单晶氮化镓(GAN)本体合成方法和装置

  • Patent Title: Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis
  • Patent Title (中): 单晶氮化镓(GAN)本体合成方法和装置
  • Application No.: US09836780
    Application Date: 2001-04-16
  • Publication No.: US06407409B2
    Publication Date: 2002-06-18
  • Inventor: Hak Dong ChoSang Kyu Kang
  • Applicant: Hak Dong ChoSang Kyu Kang
  • Main IPC: H01L2922
  • IPC: H01L2922
Method and apparatus for single crystal gallium nitride (GAN) bulk synthesis
Abstract:
A method and apparatus for homoepitaxial growth of freestanding, single bulk crystal Gallium Nitride (GaN) are provided, wherein a step of nucleating GaN in a reactor results in a GaN nucleation layer having a thickness of a few monolayers. The nucleation layer is stabilized, and a single bulk crystal GaN is grown from gas phase reactants on the GaN nucleation layer. The reactor is formed from ultra low oxygen stainless steel.
Information query
Patent Agency Ranking
0/0