发明授权
US06410670B1 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
有权
具有羟基和羧基的光致抗蚀剂单体，其共聚物和使用其的光致抗蚀剂组合物
- 专利标题： Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
- 专利标题（中）： 具有羟基和羧基的光致抗蚀剂单体，其共聚物和使用其的光致抗蚀剂组合物
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申请号： US09383861申请日： 1999-08-26
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公开(公告)号： US06410670B1公开(公告)日： 2002-06-25
- 发明人: Geun Su Lee , Cha Won Koh , Jae Chang Jung , Min Ho Jung , Ki Ho Baik
- 申请人： Geun Su Lee , Cha Won Koh , Jae Chang Jung , Min Ho Jung , Ki Ho Baik
- 优先权： KR98-34694 19980826; KR98-39079 19980921
- 主分类号： C08J13208
- IPC分类号： C08J13208
摘要：
The present invention relates to novel monomers and their polymers, which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist compositions prepared therefrom. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, R is substituted or non-substituted linear or branched (C1-C10)alkyl, substituted or non-substituted (C1-C10)ether, substituted or non-substituted (C1-C10)ester, or substituted or non-substituted (C1-C10)ketone; X and Y are independently CH2, CH2CH2, oxygen or sulfur; and i is 0 or an integer of 1 to 2.
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