发明授权
- 专利标题： Resist compositions and patterning process
- 专利标题（中）： 抗蚀剂组合物和图案化工艺
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申请号： US09572973申请日： 2000-05-18
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公开(公告)号： US06413695B1公开(公告)日： 2002-07-02
- 发明人: Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
- 申请人： Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
- 优先权： JP11-138086 19990519
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
A resist composition comprising an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester compound as a dissolution regulator has a high sensitivity, resolution, etching resistance and storage stability and lends itself to micropatterning with electron beams or deep-UV rays.
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