发明授权
- 专利标题： Photohardenable resin composition providing heat-resistant photohardened product
- 专利标题（中）： 提供耐热光硬化产品的可光硬化树脂组合物
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申请号： US09478462申请日： 2000-01-06
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公开(公告)号： US06413698B1公开(公告)日： 2002-07-02
- 发明人: Yorikazu Tamura , Tsuneo Hagiwara , Makoto Ohtake , Minoru Shinoda , Toshiharu Suzuki , Tatsuhiko Ozaki , Yasushi Ishihama , Takayuki Nakamura
- 申请人： Yorikazu Tamura , Tsuneo Hagiwara , Makoto Ohtake , Minoru Shinoda , Toshiharu Suzuki , Tatsuhiko Ozaki , Yasushi Ishihama , Takayuki Nakamura
- 优先权： JP11-003499 19990108
- 主分类号： G03F7028
- IPC分类号： G03F7028
摘要：
A photohardenable resin composition comprising (A) a urethanated acrylic compound represented by formula (I): (A)a—C—(R)4−a wherein R is H or alkyl; a is 3 or 4; and A represents a group of formula (II): wherein D represents —CH2CH2O—, —CH2CH(CH3)O—, —CH2CH2COO— or —(CH2)6COO—; E represents —CH2CH2O—, —CH2CH(CH3)O—, —COCH2CH2O— or —CO(CH2)6O—; G represents a diol or triol residual group; J represents a divalent or trivalent and substituted or unsubstituted hydrocarbon group; L represents —(CH2CH2O)h— (h: integer of 1 to 4), —(CH2CH(CH3)O)j— (j: integer of 1 to 4), or —(CH2CH2O)k—(CH2CH(CH3)O)m— (k, m: integer of 1 to 3 (k+m=2, 3 or 4); b, c, and d are each 0 or 1 (b+c+d=1, 2 or 3); e is 0, 1 or 2; f is 0 or 1 (e+f=1 or 2); and g is 1 or 2, and (B) a radical polymerizable compound at a (A) : (B) ratio of 80:20 to 10:90 by weight.
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