发明授权
US06413863B1 Method to resolve the passivation surface roughness during formation of the AlCu pad for the copper process
有权
在铜工艺的AlCu焊盘形成期间,解决钝化表面粗糙度的方法
- 专利标题: Method to resolve the passivation surface roughness during formation of the AlCu pad for the copper process
- 专利标题(中): 在铜工艺的AlCu焊盘形成期间,解决钝化表面粗糙度的方法
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申请号: US09489971申请日: 2000-01-24
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公开(公告)号: US06413863B1公开(公告)日: 2002-07-02
- 发明人: Chung-Shi Liu , Shau-Lin Shue , Chen-Hua Yu
- 申请人: Chung-Shi Liu , Shau-Lin Shue , Chen-Hua Yu
- 主分类号: H01L2144
- IPC分类号: H01L2144
摘要:
In accordance with the objectives of the invention a new method is provided to create aluminum pads that overlay an electrical contact point. A layer of passivation is deposited over the surface that contains one or more electrical contact points, the layer of passivation is patterned thereby creating openings in the layer of passivation that overlay and align with one or more of the contact points. Under the first embodiment of the invention, a layer of AlCu is deposited over the patterned layer of passivation thereby including the openings that have been created in the layer of passivation. The deposited layer of AlCu is patterned and etched thereby creating the required AlCu bond pad. In addition to creating the required AlCu bond pad, the etch of the layer of AlCu also creates a pattern of dummy AlCu pads that are not in contact with any underlying points of electrical contact but that are located on the surface of the layer of passivation. The dummy AlCu pads counteract the above indicated effect of theta phase propagation that occurs during the AlCu etching resulting in a passivation layer that has a smooth surface and that therefore provides a good underlying layer for the created AlCu pads. Under the second embodiment of the invention, a layer of pure aluminum is sputter deposited over the passivation layer including the openings that has been created in the passivation layer. The deposited layer of aluminum is patterned and etched thereby creating the required aluminum pad.
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