发明授权
US06416926B1 Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
失效
二硫化双环化合物，含聚合物的所述化合物和使用其的光致抗蚀剂微图案形成方法
- 专利标题： Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
- 专利标题（中）： 二硫化双环化合物，含聚合物的所述化合物和使用其的光致抗蚀剂微图案形成方法
-
申请号： US09630818申请日： 2000-08-02
-
公开(公告)号： US06416926B1公开(公告)日： 2002-07-09
- 发明人: Jae Chang Jung , Chi Hyeong Roh , Min Ho Jung , Geun Su Lee , Ki Ho Baik
- 申请人： Jae Chang Jung , Chi Hyeong Roh , Min Ho Jung , Geun Su Lee , Ki Ho Baik
- 优先权： KR98-17211 19980513
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
The present invention provides heterobicyclo compounds of the formula: and a method for preparing the same, where Z, X, R1, R2, and m are those defined herein. Compounds of the present invention can be used as monomers for preparing a photoresist resin which is useful, for example, ultra-violet wavelength photolithography processes.
信息查询
