发明授权
US06423471B1 Photosensitive composition and method of making lithographic printing plate 失效
光敏组合物和制备平版印刷版的方法

  • 专利标题: Photosensitive composition and method of making lithographic printing plate
  • 专利标题(中): 光敏组合物和制备平版印刷版的方法
  • 申请号: US09620990
    申请日: 2000-07-20
  • 公开(公告)号: US06423471B1
    公开(公告)日: 2002-07-23
  • 发明人: Tadahiro SororiYasufumi Murota
  • 申请人: Tadahiro SororiYasufumi Murota
  • 优先权: JP11-209822 19990723
  • 主分类号: B03F7027
  • IPC分类号: B03F7027
Photosensitive composition and method of making lithographic printing plate
摘要:
A photosensitive composition comprising (i) at least one titanocene compound (ii) an addition polymerizable compound containing at least one ethylenically unsaturated double bond and (iii) at least one pigment having an optical characteristic such that the transmittance at 500 nm is relatively smaller than the transmittance at 400 nm. Also disclosed is a method of producing a lithographic printing plate using a lithographic printing plate precursor comprising the photosensitive composition.
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