发明授权
- 专利标题: Method for manufacturing semiconductor dynamic quantity sensor
- 专利标题(中): 制造半导体动态量传感器的方法
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申请号: US09861535申请日: 2001-05-22
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公开(公告)号: US06423563B2公开(公告)日: 2002-07-23
- 发明人: Tsuyoshi Fukada , Minekazu Sakai , Minoru Murata , Yukihiro Takeuchi , Seiki Aoyama
- 申请人: Tsuyoshi Fukada , Minekazu Sakai , Minoru Murata , Yukihiro Takeuchi , Seiki Aoyama
- 优先权: JP10-126288 19980508; JP10-369840 19981225; JP11-41967 19990219
- 主分类号: H01L2984
- IPC分类号: H01L2984
摘要:
A semiconductor dynamic quantity sensor includes a semiconductor support substrate having a specific resistance equal to or less than 3&OHgr; cm. An insulation film is provided on the support substrate and a semiconductor layer is provided on the support substrate with the insulation film interposed therebetween. The semiconductor layer has a specific resistance equal to or less than 3&OHgr; cm. A movable electrode is provided in the semiconductor layer to be displaced according to a dynamic quantity acting thereto. A fixed electrode is fixedly provided in the semiconductor layer to make a specific gap with the movable electrode and to from a capacitor with the movable electrode. The capacitor has a capacity that changes in response to displacement of the movable electrode to detect the dynamic quantity.