发明授权
US06430468B1 Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber 失效
将半导体晶片精确放置在单个反应室内的相应平台上的方法和装置

  • 专利标题: Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber
  • 专利标题(中): 将半导体晶片精确放置在单个反应室内的相应平台上的方法和装置
  • 申请号: US09716039
    申请日: 2000-11-17
  • 公开(公告)号: US06430468B1
    公开(公告)日: 2002-08-06
  • 发明人: Avi TepmanLawrence Chung-Lai Lei
  • 申请人: Avi TepmanLawrence Chung-Lai Lei
  • 主分类号: G06F700
  • IPC分类号: G06F700
Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber
摘要:
Method and apparatus are provided for accurately placing first and second semiconductor wafers onto a first and a second platforms, respectively, in a single processing chamber despite changes in the exact positions of the platforms caused by variations in temperature within the chamber. A computer controls a mechanism having a pair of wafer-supporting blades to insert the wafers into the chamber. The computer determines from position sensors when the first wafer is centered over the first platform, then actuates lift pins associated with the first platform to lift the first wafer off of its respective blade. Then the computer in the same way in response to other position sensors moves the second wafer into alignment with the second platform, and raises by lift pins the second wafer off of its respective blade. Thereafter the computer removes the blades from the chamber, and lowers the wafers in precise positions onto their respective platforms.
信息查询
0/0