发明授权
US06432259B1 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
有权
等离子体反应器冷却的天花板，具有热隔离等离子体加热的微型气体分布板阵列
- 专利标题： Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
- 专利标题（中）： 等离子体反应器冷却的天花板，具有热隔离等离子体加热的微型气体分布板阵列
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申请号： US09461682申请日： 1999-12-14
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公开(公告)号： US06432259B1公开(公告)日： 2002-08-13
- 发明人: Hamid Noorbakhsh , Michael Welch , Siamak Salimian , Paul Luscher , Hongching Shan , Kaushik Vaidya , Jim Carducci , Evans Lee
- 申请人： Hamid Noorbakhsh , Michael Welch , Siamak Salimian , Paul Luscher , Hongching Shan , Kaushik Vaidya , Jim Carducci , Evans Lee
- 主分类号： H05H100
- IPC分类号： H05H100
摘要：
A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate for introducing a process gas into the reactor is supported on the chamber enclosure member and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.