发明授权
US06432609B1 Photoacid generators, photoresists containing the same, and method of undergoing a photoacid-catalyzed reaction in a resin system using the same
有权
光酸产生剂，含有它们的光致抗蚀剂以及在使用其的树脂体系中进行光酸催化反应的方法
- 专利标题： Photoacid generators, photoresists containing the same, and method of undergoing a photoacid-catalyzed reaction in a resin system using the same
- 专利标题（中）： 光酸产生剂，含有它们的光致抗蚀剂以及在使用其的树脂体系中进行光酸催化反应的方法
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申请号： US09621632申请日： 2000-07-21
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公开(公告)号： US06432609B1公开(公告)日： 2002-08-13
- 发明人: Jui-Hsiang Liu
- 申请人： Jui-Hsiang Liu
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
The present invention proposes a novel photoacid generator, and a method of undergoing a photoacid-catalyzed reaction of a resin system, e.g. a curing reaction. The photoacid generator has the following structure of formula (I) wherein R′ and R are radicals which enable the photoacid generator (I) forming a compound (II) and a proton acid RH under irradiation: The present invention also discloses positive tone and negative tone photoresists containing the photoacid generator (I).
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