发明授权
US06433346B1 Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising same
失效
静电掩模板卡盘，带电粒子束微光刻设备和方法以及包括该静电掩模板的半导体器件制造方法
- 专利标题： Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising same
- 专利标题（中）： 静电掩模板卡盘，带电粒子束微光刻设备和方法以及包括该静电掩模板的半导体器件制造方法
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申请号： US09560913申请日： 2000-04-28
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公开(公告)号： US06433346B1公开(公告)日： 2002-08-13
- 发明人: Noriyuki Hirayanagi
- 申请人： Noriyuki Hirayanagi
- 优先权： JP11-296573 19991019
- 主分类号： H01J3720
- IPC分类号： H01J3720
摘要：
Electrostatic reticle chucks are disclosed that provide strong reticle-holding force and that can be used in a subatmospheric-pressure environment as encountered in charged-particle-beam microlithography. The chucks are suited especially for holding reticles made from a silicon reticle substrate. The attractive force is established between a reticle-contacting surface of the chuck comprising a dielectric material, and the reticle. Depthwise beneath the dielectric material is at least one electrode. The dielectric material has a property such that, when the electrode is energized, the reticle is attracted to the reticle-contacting surface by a Johnsen-Rahbek force. To such end, by way of example, the dielectric material has a volume resistivity of no greater than 1013 &OHgr;-cm. The Johnsen-Rahbek force holds the reticle much more strongly than the Coulomb force produced by conventional reticle chucks.