发明授权
US06437284B1 Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
有权
用于激光热处理的光学系统和设备以及使用该半导体器件的半导体器件的制造方法
- 专利标题: Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
- 专利标题(中): 用于激光热处理的光学系统和设备以及使用该半导体器件的半导体器件的制造方法
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申请号: US09599645申请日: 2000-06-23
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公开(公告)号: US06437284B1公开(公告)日: 2002-08-20
- 发明人: Tatsuki Okamoto , Tetsuya Ogawa , Keisuke Furuta , Hidetada Tokioka , Tomohiro Sasagawa , Junichi Nishimae , Mitsuo Inoue , Yukio Sato
- 申请人: Tatsuki Okamoto , Tetsuya Ogawa , Keisuke Furuta , Hidetada Tokioka , Tomohiro Sasagawa , Junichi Nishimae , Mitsuo Inoue , Yukio Sato
- 优先权: JP11-179233 19990625
- 主分类号: B23K2606
- IPC分类号: B23K2606
摘要:
An optical system that controls laser beam spot profile for forming a high performance thin film by a laser heat treatment process is provided. In the optical system that irradiates a rectangular laser beam on a film formed on a substrate, intensity distribution forming, apparatus makes the intensity distribution uniform in the longitudinal direction while maintaining the properties of the laser beam 2 such as directivity in the direction of shorter side, making it possible to concentrate the light to a limit permitted by the nature of the laser beam and achieve the maximum intensity gradient on the film disposed on the substrate. Thus a steep temperature distribution can be generated on the film disposed on the substrate and, as a result, high performance thin film can be formed.
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